![]() ![]() The improved polishing performance can be attributed to (i) the optimization of interfacial contact state and material removal behavior, (ii) the increasements of trivalent cerium and oxygen vacancy, and (iii) the enhancement of photochemical and tribochemical activities of the mSiO 2 heterostructured abrasive systems. ![]() ![]() Furthermore, the as-proposed composites allowed an evident removal efficiency enhancement in the presence of ultraviolet light radiation. Compared to commercial CeO 2 NPs, the mSiO 2 abrasives enabled superior fused silica surface quality in both CMP and PCMP tests. The developed composite particles involved low-modulus mesoporous silica (mSiO 2) cores and high-activity Gd-doped ceria (CeO 2) shells. Herein, novel multicomponent core–shell abrasive systems have been fabricated via an efficient chemical approach towards photochemical (photo-assisted chemical) mechanical polishing (PCMP) processes. Nanoparticles (NPs) are widely used in polishing slurries for ensuring desired material removal and global planarization. ![]()
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